Improved oxidation properties from a reduced B content in sputter-deposited TiBx thin films
نویسندگان
چکیده
Transition-metal diboride thin films, which have high melting points, excellent hardness, and good chemical thermal conductivity, severely suffer from rapid oxidation in air. Here, we explore the influence of varying B content resulting nanostructure change on properties TiBx with x = 1.43, 2.20, 2.70. Results show that all as-deposited layers columnar structure. The column boundaries TiB2.20 TiB2.70 films grown by direct current magnetron sputtering (DCMS) are B-rich, while TiB1.43 high-power impulse (HiPIMS) no apparent grain boundary phases contain Ti-rich planar defects. rate air-annealed at 400 °C up to 48 h is significantly lower than films. TiB1.43, TiB2.20, was measured 2.9 ± 1.5, 7.1 1.0, 20.0 5.0 nm/h, respectively, spallation even as thick oxide scales 0.5 μm any improved resistance can be explained absence B-rich tissue phase understoichiometric a interlaces nanocolumnar TiB2 structures corresponding overstoichiometric An easy pathway thus eliminated.
منابع مشابه
Physical Properties of Reactively Sputter-Deposited C-N Thin Films
This work aims to prepare and study amorphous carbon nitride (CNx) films. Films were deposited by reactive magnetron radiofrequency (RF) sputtering from graphite target in argon and nitrogen mixture discharge at room temperature. The ratio of the gas flow rate was varied from 0.1 to 1. Deposited films were found to be amorphous. Highest Nitrogen concentration achieved was 42 atomic percent whic...
متن کاملSputter-deposited Sma Thin Films: Properties and Applications
Shape memory alloy (SMA) thin films formed by sputter deposition have attracted considerable attention in the last decade. Current intensive research demonstrated that thin films' unique fine microstructure is responsible for superior shape memory characteristics in films, compared to that of bulk materials. Simultaneously, much effort has been taken in the development and fabrication of microd...
متن کاملA theoretical model for the electrical properties of chromium thin films sputter deposited at oblique incidence
متن کامل
Growth, structure and stability of sputter-deposited MoS2 thin films
Molybdenum disulphide (MoS2) thin films have received increasing interest as device-active layers in low-dimensional electronics and also as novel catalysts in electrochemical processes such as the hydrogen evolution reaction (HER) in electrochemical water splitting. For both types of applications, industrially scalable fabrication methods with good control over the MoS2 film properties are cru...
متن کاملذخیره در منابع من
با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید
ژورنال
عنوان ژورنال: Surface & Coatings Technology
سال: 2021
ISSN: ['1879-3347', '0257-8972']
DOI: https://doi.org/10.1016/j.surfcoat.2021.127353